Method of producing a two-dimensional electron gas semiconductor device

ABSTRACT

Disclosed is a method of producing a compound semiconductor device comprising an enhancement-mode transistor and a depletion-mode transistor, each of which has a heterojunction and utilizes a two-dimensional electron gas. The method of producing the device comprises the steps of: forming an undoped GaAs channel layer on a semi-insulating GaAs substrate; forming an N-type AlGaAs electron-supply layer so as to form the heterojunction; forming an N-type GaAs layer; forming an AlGaAs layer; selectively etching the AlGaAs layer to form a recess; performing an etching treatment using an etchant which can etch rapidly GaAs and etch slowly AlGaAs to form simultaneously grooves for gate electrodes of the enhancement-mode transistor and the depletion-mode transistor, the bottoms of the grooves being in the N-type AlGaAs layer and the distance between the bottoms being equal to the thickness of the AlGaAs layer; and forming simultaneously the gate electrodes in the grooves.

This is a division of application Ser. No. 676,359 filed Nov. 29, 1984,now U.S. Pat. No. 4,742,379.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device comprising anenhancement-mode field-effect transistor and a depletion-modefield-effect transistor, each of which has a heterojunction and uses atwodimensional electron gas.

2. Description of the Related Art

In order to increase the performance of a computer, it is preferable toincrease the operating speed of a semiconductor device and to decreasethe power consumption thereof. Therefore, many proposals have been madeon transistors made of a compound semiconductor such as gallium-arsenide(GaAs) since the carrier mobility thereof is far greater than that ofsilicon (Si), which is generally used in current semiconductor devices.In the transistors of a compound semiconductor, field-effecttransistors, particularly Schottky barrier-type field-effecttransistors, are generally produced since the production process thereofis easier than that of bipolar transistors.

In a field-effect transistor made of GaAs or Si and having aconventional structure, carriers move in a semiconductor crystal inwhich impurity ions exist. The moving carriers are scattered by thelattice vibration and the impurity ions, whereby the carrier mobility islimited. The lattice scattering effect can be reduced by lowering thetemperature, but the ionized impurity scattering effect is not reduced.

It is possible to eliminate the ionized impurity scattering effect byseparating the region of carrier movement from the region doped withimpurities with the interface of a heterojunction. The combination ofthe low temperature and the heterojunction increases the carriermobility so that such a heterojunction-type field-effect transistor canbe operated faster than the above-mentioned conventional field-effecttransistors.

For example, the heterojunction-type field-effect transistor comprises asemi-insulating GaAs substrate, an undoped GaAs layer (semiconductorchannel layer), an N-type aluminum-gallium-arsenide layer (AlGaAs;electronsupply layer), and an N-type GaAs layer (contact layer), whichlayers are formed in sequence on the GaAs substrate by a molecular beamepitaxy (MBE) method or a metal organic chemical vapor deposition(MOCVD) method. The undoped GaAs layer and the N-type AlGaAs layer formthe heterojunction. The N-type AlGaAs layer has an electron affinitysmaller than that of the undoped GaAs layer and contains donorimpurities. The N-type GaAs layer and, if necessary, the N-type AlGaAslayer are selectively etched to form a groove for a gate electrode sothat a predetermined distance between the top surface of the undopedGaAs layer (i.e., the interface of the heterojunction) and the bottom ofthe gate electrode is obtained. The distance has an influence on thegate threshold voltage of the field-effect transistor. In theabove-mentioned heterojunction-type field-effect transistor, atwo-dimensional electron gas is generated in the undoped GaAs layer atthe heterojunction interface by transferring electrons into the undopedGaAs layer from the N-type AlGaAs layer and serves as a channel. Theelectron density of the channel is controlled by an applied voltage ofthe gate so that the impedance between the source electrode and thedrain electrode is controlled.

When a semiconductor device comprising an enhancement-mode transistorand a depletion-mode transistor is produced by utilizing theabove-mentioned heterojunction-type field-effect transistor, namely,when at least two heterojunction-type field-effect transistors havingdifferent gate threshold voltages are produced on the samesemi-insulating GaAs substrate by varying a thickness of the N-type GaAsand, if necessary, the N-type AlGaAs under the gate electrodes, it isnecessary to form suitable grooves for the gate electrodes by accuratelyetching the layers formed on the undoped GaAs layer, respectively.However, such etching process is complicated, and accurate etchingcontrol is difficult.

SUMMARY OF THE INVENTION

An object of the present invention is to simplify the production of asemiconductor device comprising an enhancement-mode transistor and adepletion-mode transistor, which are heterojunction-type field-effecttransistors, and to utilize a two-dimensional electron gas.

Another object of the present invention is to provide an improved methodof producing a semiconductor device so as to accurately control the gatethreshold voltages and increase the production yield.

A further object of the present invention is to provide a semiconductordevice produced by the improved method.

The above and other objects of the present invention are attained byproviding a method of producing a semiconductor device which comprisesan enhancement-mode transistor and a depletion-mode transistor, has aheterojunction, and utilizes a two-dimensional electron gas, comprisingthe steps of: forming a semiconductor channel layer, in which thetwo-dimensional electron gas is generated, on a semi-insulating compoundsemiconductor substrate; forming an electron-supply layer on thesemiconductor channel layer, which layers form the heterojunction;forming a first semiconductor layer having a composition different fromthe electron-supply layer on the electron-supply layer; selectivelyetching at least the semiconductor layer to form grooves of theenhancement-mode transistor and of the depletion-mode transistor,respectively; and forming the gate electrodes in the grooves;characterized in that a second semiconductor layer having a compositiondifferent from the first semiconductor layer is formed on the firstsemiconductor layer after the formation step thereof, a portion of thesecond semiconductor layer corresponding to the gate region of theenhancement-mode transistor is selectively etched to form a recess, andin the etching step, the grooves are simultaneously etched by using anetchant which can etch rapidly the first semiconductor layer and etchslowly the second semiconductor layer and the electron-supply layer sothat the exposed portion of the first semiconductor layer and a portionof the electron-supply layer having a thickness corresponding to thethickness of the second semiconductor layer are etched to form thegroove for the gate electrode of the enhancement-mode transistor and aportion of the second semiconductor layer and a portion of the firstsemiconductor layer are etched to form the groove for the depletion-modetransistor, in which the electron-supply layer is exposed. In this case,if the second semiconductor layer is of the same material as theelectron-supply layer, the thickness of the second semiconductor layeris equal to the difference in distance between the interface of theheterojunction and the bottom of the gate electrodes of theenhancement-mode transistor and the depletion-mode transistor.

It is possible to make the difference in distance greater by forming athird semiconductor layer and a fourth semiconductor layer between theelectron-supply layer and the first semiconductor layer, the thirdsemiconductor layer being of the same material as the firstsemiconductor layer and being formed on the electron-supply layer andthe fourth semiconductor layer being of the same material as the secondsemiconductor layer, having the same thickness as the secondsemiconductor layer, and being formed on the third semiconductor layer.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention will be more apparent from the description of thepreferred embodiments set forth below, with reference to theaccompanying drawings, in which:

FIG. 1 is a schematic sectional view of a conventional semiconductordevice comprising an enhancement-mode transistor and a depletion-modetransistor;

FIG. 2 is an inverter circuit of the semiconductor device of FIG. 1;

FIG. 3 is a graph showing the relationship between the gate thresholdvoltage and the distance between the interface of the heterojunction andthe bottom of the gate electrode;

FIGS. 4A through 4G are schematic sectional views of a semiconductordevice comprising an enhancement-mode transistor and a depletion-modetransistor in various stages of production in accordance with anembodiment of the present invention;

FIG. 5A is a schematic layer structure of the embodiment of the presentinvention;

FIG. 5B is a graph showing the etching process;

FIGS. 6A through 6G are schematic sectional views of a semiconductordevice comprising an enhancement-mode transistor and a depletion-modetransistor in various stages of production in accordance with anotherembodiment of the present invention;

FIG. 7A is a schematic layer structure of another embodiment of thepresent invention; and

FIG. 7B is a graph showing the etching process.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Before describing the preferred embodiments of the present invention, aprior technique for a semiconductor device which comprises anenhancement-mode transistor and a depletion-mode transistor, has aheterojunction, and utilizes a two-dimensional electron gas isdiscussed.

As is illustrated in FIG. 1, for example, an inverter has a conventionalstructure comprising an enhancement-mode field-effect transistor in an"E" section and a depletion-mode field-effect transistor in a "D"section. The inverter has the electric circuit of FIG. 2, in which "Tr₁" corresponds to a driven element of the enhancement-mode field-effecttransistor and "Tr₂ " corresponds to a load element of thedepletion-mode field-effect transistor.

Each of the transistors comprises a semi-insulating GaAs substrate 1, anundoped GaAs layer (semiconductor channel layer) 2, an N-type AlGaAslayer (electron-supply layer) 3, and an N-type GaAs layer (contact orcap layer) 4, which layers are formed in sequence on the substrate 1 bythe MBE method or the MOCVD method. The formed layers are selectivelyetched to form an active mesa portion isolated from another active mesaportion (not shown), as shown in FIG. 1. It is possible to use anotherisolation structure, e.g., an insulator region which is doped withoxygen ions or protons. Source and drain electrodes 5a, 5b, and 5c ofAuGe/Au, AuGe/Ni/Au, or AuGe/Ni are formed on the N-type GaAs layer 4.Alloyed regions 6a, 6b, and 6c are formed under the electrodes 5a, 5b,and 5c by a heat treatment. The enhancement-mode transistor has thesource electrode 5a and the drain electrode 5b, and the depletion-modetransistor has the source electrode 5b and the drain electrode 5c. Inthis case, the electrode 5b serves as a common electrode. A gateelectrode 7a of the enhancement-mode transistor is formed in a groovewhich extends into a portion of the N-type AlGaAs layer 3 through theN-type GaAs layer 4, while a gate electrode 7b of the depletion-modetransistor is formed in another groove which extends to the top surfaceof the N-type AlGaAs layer 3 through the N-type GaAs layer 4. Aninsulating layer 8 of, e.g., silicon dioxide (SiO₂) is formed, andsuitable internal connector lines 9a, 9b, and 9c are formed.

In the inverter, a two-dimensional electron gas 2a is generated in theundoped GaAs layer 2 at the interface of the heterojunction (of the GaAslayer and the AlGaAs layer) between the alloyed regions 6a, 6b, and 6c,as shown in FIG. 1. The two-dimensional electron gas 2a serves as achannel of the field-effect transistor and is controlled by the gatevoltage.

In the case of the above-mentioned heterojunction-type field-effecttransistor utilizing the two-dimensional electron gas, the gatethreshold voltage V_(th) is related to the distance between theinterface of the heterojunction and the bottom of the gate electrode,for example, as shown in FIG. 3. An ideal gate threshold voltage of theenhancement-mode transistor is zero (i.e., V_(th) =0 V); therefore, thedistance is about 42.5 nm according to FIG. 3. When the gate thresholdvoltage of the depletion-mode transistor is, e.g., -0.3 volts (i.e.,V_(th) =-0.3 V), the distance is about 46.5 nm.

In order to obtain suitable distances between the heterojunctioninterface and the bottom of the gate electrodes for predetermined gatethreshold voltages of the enhancement-mode and depletion-modetransistors, it is necessary to accurately etch the N-type GaAs layer 4and the N-type AlGaAs layer 3 to form grooves for the gate electrodeshaving different depths. The etching step for a groove and the formationstep of a gate electrode are repeated twice for the enhancement-mode anddepletion-mode transistors. In this case, there are problems regardingaccurate control of the etched depth and many complicated productionsteps. As a proposal, the AlGaAs layer 3 is adopted for use as anetching-stopping layer for the formation of the groove of the gateelectrode 7b of the depletion-mode transistor, as shown in FIG. 1.Therefore, the groove for the depletion-mode transistor can berelatively easily formed, but the etching process for the groove for theenhancement-mode transistor should be stopped so as to obtain a groovehaving a predetermined depth in the AlGaAs layer 3. In order to carryout exactly stoppage of the etching, the current between the source andthe drain is often monitored. Since the monitoring measurement must beperformed outside of the etching apparatus, the production efficiency isremarkably reduced. Furthermore, when many enhancement-mode anddepletion-mode transistors are produced on a substrate, the variation ofthe gate threshold voltage must be minimized.

Referring to FIGS. 4A through 4G and 5A and 5B, a semiconductor devicecomprising enhancement-mode and depletion-mode heterojunction-typefield-effect transistors and a method of producing the device accordingto a preferred first embodiment of the present invention are nowexplained.

As illustrated in FIG. 4A, on a semi-insulating GaAs substrate 10, anundoped GaAs layer 11 is formed by the MBE method or the MOCVD method.The GaAs layer 11 has a thickness of from 0.1 to 0.3 μm. An N-typeAlGaAs layer (electron-supply layer) 12 is epitaxially grown on theundoped GaAs layer 11 so that the AlGaAs layer 12 and the GaAs layer 11form a heterojunction. For example, the Al_(x) Ga_(1-x) As layer 12 isdoped with Si impurities of a dose of from 1×10¹⁷ to 2×10¹⁸ cm⁻³ and hasa thickness of e.g., 48 nm, which corresponds to the distance betweenthe heterojunction interface and the bottom of the gate electrode of thedepletion-mode transistor plus an overetching depth during the etchingstep for grooves, wherein "x" is 0.3. Then an N-type GaAs layer 13 isepitaxially grown on the AlGaAs layer 12. The GaAs layer 13 has athickness of, e.g., approximately 100 nm and is doped with Si impuritiesof a dose of from 1×10.sup. 17 to 2×10¹⁸ cm⁻³. The layers 11, 12, and 13are similar to those of a conventional semiconductor device, shown,e.g., in FIG. 1.

In accordance with the embodiment of the present invention, an N-typeAlGaAs layer 14 is epitaxially grown on the GaAs layer 13. The AlGaAslayer 14 has the substantially same composition as that of the AlGaAslayer 12 and has a thickness corresponding to the difference in distancebetween the heterojunction interface and the gate electrode bottom forthe enhancement-mode transistor and the depletion-mode transistor, e.g.,4 nm. An N-type GaAs layer 15 is epitaxially grown on the AlGaAs layer14, as shown in FIG. 4A. The GaAs layer 15 serves as a cap-protectinglayer to prevent the thickness and the surface properties of the AlGaAslayer 14 from undesirably changing due to a wafer surface treatment,such as an etching treatment, a cleaning treatment (involving theoxidation of Al), or the like. It is possible to adopt undoped AlGaAsand undoped GaAs for the layers 14 and 15, respectively, instead ofN-type AlGaAs and N-type GaAs. The layers 12, 13, 14, and 15 are formedby the MBE method or the MOCVD method.

As illustrated in FIG. 4B, the formed layers 11 to 15 are selectivelyetched by a wet etching method or a dry etching method so as to form anisolated mesa portion 16 in which transistors are formed. The etchingdepth extends into the undoped GaAs layer 11 to attain isolation betweenelements. It is possible to adopt another isolation structure, e.g., aninsulator region which is doped with oxygen ions or protons by anionimplantation method.

As illustrated in FIG. 4C, portions of the GaAs layer 15 and the AlGaAslayer 14 corrsponding to a gate region of the enhancement-modetransistor are etched by a suitable etching method to form a recess 17in which the N-type GaAs layer 13 is exposed. In this etching step, asmall portion of the N-type GaAs layer 13 may be etched.

As illustrated in FIG. 4D, the exposed surface of the compoundsemiconductor sustrate including the mesa portion 16 is covered with aninsulating protector film 18, e.g., of SiO₂. The film 18 is selectivelyetched by a conventional lithograph method to form openings for sourceand drain electrodes. In this case, the GaAs layer 15, the AlGaAs layer14, and a portion of the N-type GaAs layer 13 are etched through theopenings by a suitable etching method. Then ohmic contact electrodes18a, 18b, and 18c are formed in the openings by depositing a multilayermetal of AuGe/Au, AuGe/Ni/Au, AuGe/Ni, or the like and patterning it bya lift-off method or a lithograph method. A heat treatment for alloying(e.g., at approximately 450° C. for 1 minute) is carried out to formalloyed regions 20a, 20b, and 20c coming into ohmic contact with atwo-dimensional electron gas layer. The etching step of the layers 15,14, and 13 is not always necessary.

As illustrated in FIG. 4E, a resist film (preferably a positivephotoresist film) 21 is applied on the entire exposed surface and ispatterned to form openings 22 and 23 corresponding to gate regions ofthe enhancement-mode and depletion-mode transistors. The insulatingprotector (SiO₂) film 18 is etched through the openings 22 and 23 by asuitable etchant (e.g., a hydrofluoric acid). Then a groove 24 for thegate electrode of the enhancement-mode transistor and a groove 25 forthe gate electrode of the depletion-mode transistor are formed by usinga suitable etching method. According to the present invention, anetchant etching rapidly GaAs and slowly AlGaAs should be used in theetching method. In this case, it is preferable to apply a reactive ionetching method using an etchant gas of CCl₂ F₂ and a diluent or carriergas of helium (He) since a GaAs etching rate of from 500 to 600 nm/minand an AlGaAs etching rate of from 2 to 3 nm/min can be obtained.

The progress of the etching depth in the above-mentioned etching step isexplained in detail with reference to FIGS. 5A and 5B. In FIG. 5B, theslanted lines E and D indicate the grooves for the gate electrodes ofthe enhancement-mode and depletion-mode transistors, respectively. Thepoint R indicates the depth of the recess 17 (FIG. 4C). Since theetching rate of GaAs is much higher than that of AlGaAs, when theenhancement-mode groove 24 reaches the N-type AlGaAs layer 12, thedepletion-mode groove 25 reaches into the AlGaAs layer 14. Thereafter,when the depletion-mode groove 25 reaches the N-type AlGaAs layer 12,the depth of the enhancement-mode groove 24 extends into the layer 12 bya length which is almost the same as the thickness of the AlGaAs layer14. For a predetermined etching treatment time, the etching proceeds onthe grooves 24 and 25, with the depth difference corresponding to thethickness of the AlGaAs layer 14 being maintained. As a result ofetching, the grooves 24 and 25 are simultaneously completed so as toattain predetermined distances L₁ and L₂ between the heterojunctioninterface and the bottom of the grooves 24 and 25, respectively. Forexample, the distances L₁ and L₂ are 43 nm and 47 nm, respectively, andthe difference between the distances L₁ and L₂ is 4 nm, corresponding tothe thickness of the AlGaAs layer 14.

As illustrated in FIG. 4F, gate electrodes 26 and 27 forming a Schottkybarrier are formed in the grooves 24 and 25 by depositing metal, such asTi/Pt/Au and Al, and patterning the deposited metal by a lift-offmethod. Thus, the gate electrode 26 of the enhancement-mode transistorand the gate electrode 27 of the depletion-mode transistor aresimultaneously completed, and a two-dimensional electron gas 11A isgenerated in the undoped GaAs layer 11 at the heterojunction between thealloyed regions 20a, 20b, and 20c.

As illustrated in FIG. 4G, an insulating film 28, e.g., of SiO₂, isdeposited on the entire exposed surface and is selectively etched toform contact holes. Then internal connector lines 29a, 29b, 29c, and 29dare formed by depositing metal such as Au, Ti/Au, Ti/Pt/Au, Cr/Au, andAl and patterning the metal. Thus, an inverter having the circuit ofFIG. 2 is completed.

In the above-mentioned embodiment of the present invention, the channellayer 11 is made of GaAs and the electron-supply layer 12 is made ofAlGaAs. However, if the electron affinity of the upper layer 12 isgreater than that of the lower layer 11 and the lattice constant of theupper layer 12 is equal or similar to that of the lower layer 11,germanium (Ge), indium-antimonide (InSb), or indium-arsenide (InAs) maybe used for the lower layer 11 and AlGaAs, GaAs, cadmium-telluride(CdTe), or gallium-antimonide (GaSb) may be used for the upper layer 12.It is possible to use combinations of Ge (lower layer) and AlGaAs (upperlayer), Ge and GaAs, InSb and CdTe, and InAs and GaSb in addition to theabove-mentioned combination of GaAs and AlGaAs. The layers 13 and 15 maybe made of Ge, InSb, or InAs, and the layer 14 may be made of AlGaAs,CdTe, or GaSb. It is possible to adopt a suitable etchant in accordancewith compound semiconductor materials used for a semiconductor deviceaccording to the present invention.

Referring to FIGS. 6A through 6G and 7A and 7B, a semiconductor device(inverter) having the circuit of FIG. 2 and a method of producing thedevice according to a second embodiment of the present invention are nowexplained. The structure of the semiconductor device of FIG. 6G issimilar to that of the device of FIG. 4G except that two layers 43 and44 are additionally formed on an N-ype AlGaAs electron-supply layer 42.A feature of this embodiment makes the difference in distance between L₃and L₄ of FIG. 7B larger than that of L₁ and L₂ of the above-mentionedfirst embodiment without increasing the etching time. The semiconductordevice of the second embodiment is useful for making the difference ofthe gate threshold voltage of an enhancement-mode transistor and adepletion-mode transistor large or for decreasing the gate capacitanceof both of the transistors by reducing the impurity concentration ofboth.

As illustrated in FIG. 6A, on a semi-insulating GaAs substrate 40, anundoped GaAs channel layer 41 having a thickness of from 0.1 to 0.3 μmis epitaxially formed. An N-type AlGaAs electron-supply layer 42 isepitaxially grown on the undoped GaAs layer 41 to form a heterojunctionwith the GaAs layer 41. The N-type Al_(x) Ga_(1-x) As layer 42 (x=0.3)is doped with Si impurities of a dose of from 1×10¹⁷ to 2×10¹⁸ cm⁻³ andhas a thickness corresponding to the distance L₃, e.g. 44 to 10 nm,between the heterojunction interface and the bottom of a groove 56 (FIG.6E), i.e., the gate electrode of the enhancement-mode transistor. Inaccordance with the second embodiment of the present invention, anN-type GaAs layer 43 and an N-type AlGaAs layer 44 are continuouslyformed on the AlGaAs layer 42. The total thickness of the layers 43 and44 corresponds to the difference (L₄ -L₃) between the distances L₃ andL₄ from the heterojunction interface to the bottom of the grooves (i.e.,gate electrodes) of the enhancement-mode transistor and thedepletion-mode transistor e.g., 10 nm or more. For example, the GaAslayer 43 is doped with Si impurities of from 1×10¹⁷ to 2×10¹⁸ cm⁻³ andhas a thickness of up to 20 nm, e.g., 6 nm. The AlGaAs layer 44 is alsodoped with Si impurities of from 1×10¹⁷ to 2×10¹⁸ cm⁻³ and has athickness of, e.g., 4 nm. Then an N-type GaAs layer 45 is epitaxiallygrown on the AlGaAs layer 44. The GaAs layer 45 has a thickness of,e.g., approximately 100 nm, and is doped with Si impurities of from1×10¹⁷ to 2×10¹⁸ cm⁻³. An N-type AlGaAs layer 46 having a thicknessequal to that of the AlGaAs layer 44, e.g., 4 nm, and an N-type GaAscap-protecting layer 47 are epitaxially formed on the GaAs layer 45. Thelayers 41 to 47 are formed by the MBE method or the MOCVD method.

As illustrated in FIG. 6B, the formed layers 41 to 47 are selectivelyetched by a suitable etching method so as to form an isolated mesaportion 48 in which transistors are formed. Namely, isolation betweenelements is attained.

As illustrated in FIG. 6C, portions of the GaAs layer 47 and the AlGaAslayer 46 corresponding to a gate region of the enhancement-modetransistor are selectively etched to form a recess 49. In this etchingstep, a small portion of the N-type GaAs layer 45 may be etched.

As illustrated in FIG. 6D, an insulating material such as SiO₂ isapplied on the entire exposed surface to form an insulating protectorfilm 50. The film 50 is selectively etched by a lithograph method toform openings for source and drain electrodes. The GaAs layer 47, theAlGaAs layer 46, and the GaAs layer 45 are etched through the openingsby a suitable etching method. Ohmic contact electrodes (i.e., source anddrain electrodes) 51a, 51b, and 51c are formed in the openings bydepositing metal such as AuGe/Au and patterning the metal layer by,e.g., a lift-off method. A heat treatment for alloying is carried out toform alloyed regions 52a, 52b, and 52c coming into ohmic contact with atwo-dimensional electron gas layer.

As illustrated in FIG. 6E, a resist film (e.g., a positive photoresistfilm) 53 is applied on the entire exposed surface and is patterned toform openings 54 and 55 corresponding to gate regions of thetransistors. The insulating protector film 50 is etched through theopenings 54 and 55 with a suitable etchant. Then a groove 56 for thegate electrode of the enhancement-mode transistor and groove 57 for thegate electrode of the depletion-mode transistor are formed such as bythe above-mentioned reactive ion etching method using CCl₂ F₂ gas and Hegas.

The progress of the etching depth in the reactive ion etching step isshown in FIGS. 7A and 7B. In FIG. 7B, the slanted lines E and D indicatethe grooves for the gate electrodes of the enhancement-mode anddepletion-mode transistors, respectively. The point R indicates thedepth of the recess 49 (FIG. 6C). Since the etching rate of GaAs is muchhigher than that of AlGaAs, as mentioned in the first embodiment, andthe thickness of the AlGaAs layer 46 is equal to that of the AlGaAslayer 44, the formation of the groove 56 at the AlGaAs layer 42 isalmost simultaneous with the formation of the groove 57 at the AlGaAslayer 44. Thereafter, the etching proceeds at a very slow rate in bothof the AlGaAs layers 42 and 44. As a result of etching, the grooves 56and 57 are simultaneously completed so as to attain predetermineddistances L₃ and L₄ (FIG. 7B). For example, the distances L₃ and L₄ are43 nm and 53 nm, respectively, and the difference between the distancesL₃ and L₄ is 10 nm, corresponding to the total thickness of the layers43 and 44.

As illustrated in FIG. 6F, gate electrodes 58 and 59 are formed in thegrooves 56 and 57 by depositing metal such as Ti/Pt/Au and Al andpatterning it. Thus, the gate electrode 58 of the enhancement-modetransistor and the gate electrode 59 of the depletion-mode transistorare simultaneously completed, and a two-dimensional electron gas 60 isgenerated in the undoped GaAs layer 41 at the heterojunction between thealloyed regions 52a, 52b, and 52c.

As illustrated in FIG. 6G, an insulating film 61, e.g., of SiO₂, isdeposited on the entire exposed surface and is selectively etched toform contact holes. Then conductor lines 62a, 62b, 62c, and 62d areformed by a conventional process. Thus, the inverter comprisingenhancement-mode and depletion-mode heterojunction-type field-effecttransistors is completed.

According to the present invention, it is possible to carry out theformation of grooves having different depths for the enhancement-modetransistor and the depletion-mode transistor simultaneously, i.e., by anetching step. Since the bottom of the grooves is an AlGaAs layer inwhich the etching rate is very slow, the depth of the grooves, i.e., thedistance from the heterojunction interface to the bottom of the gateelectrodes, can be easily and accurately controlled. Therefore, a gooduniformity of the gate threshold voltages of the enhancement-mode anddepletion-mode transistors in a substrate (wafer) can be obtained,thereby contributing to an increase in the production yield.

It will be obvious that the present invention is not restricted to theabove-mentioned embodiments and that many variations are possible forthose skilled in the art without departing from the scope of the presentinvetion.

We claim:
 1. A method of producing a semiconductor device whichcomprises an enhancement-mode transistor and a depletion-mode transistoron a common substrate, has a heterojunction, and utilizes atwo-dimensional electron gas, comprising the steps of:forming asemiconductor channel layer, in which the two-dimensional electron gasis generated, on a semi-insulating compound semiconductor substrate;forming an electron supply layer of AlGaAs on said semiconductor channellayer, which layers form the heterojunction; forming a firstsemiconductor layer of GaAs on said electron supply layer; forming asecond semiconductor layer of AlGaAs on said first semiconductor layer;selectively etching a portion of said second semiconductor layercorresponding to a gate region of the enhancement-mode transistor toform a recess in which said first semiconductor layer is exposed; in acommon etching method, etching the exposed portion of said firstsemiconductor layer and a portion of said electron supply layer having athickness corresponding to the thickness of said second semiconductorlayer to form a groove for the gate of the enhancement-mode transistorand simultaneously etching a portion of said second semiconductor layerand a portion of said first semiconductor layer to expose said electronsupply layer and to form another groove for the gate electrode of thedepletion-mode transistor; and forming said gate electrodes in saidgrooves, respectively; wherein said etching method is a reactive ionetching method using an etching gas comprising CCl₂ F₂, which etchesrapidly said first semiconductor layer of GaAs and etches slowly saidsecond semiconductor layer and said electron supply layer of AlGaAs. 2.A method according to claim 1, wherein said semiconductor channel layer,said electron-supply layer, said first semiconductor layer, and saidsecond semiconductor layer are formed by a molecular beam epitaxymethod.
 3. A method according to claim 1, wherein said semiconductorchannel layer, said electron-supply layer, said first semiconductorlayer, and said second semiconductor layer are formed by a metal organicchemical vapor deposition method.
 4. A method according to any one ofclaims 1, 2 or 3, further comprising the steps, before said formationstep of the first semiconductor layer, of:forming a third semiconductorlayer, being of the same material as said first semiconductor layer, onsaid electron-supply layer; and forming a fourth semiconductor layer,being of the same material as said second semiconductor layer and havingthe same thickness as said second semiconductor layer, on said thirdsemiconductor layer.
 5. A method according to claim 4, wherein in saidetching step for the grooves, portions of said fourth and thirdsemiconductor layers are also etched to form said groove for theenhancement-mode transistor in which said electron-supply layer isexposed and said other groove for the depletion-mode transistor isformed so as to expose said fourth semiconductor layer at the bottomthereof.